Title :
Submicrometre X-ray printing with X-ray masks delineated by high-voltage electron-beam writing
Author :
Kawabuchi, K. ; Sakurai, S. ; Yoshimi, M.
Author_Institution :
Toshiba Corporation, Integrated Circuits Laboratory, Toshiba Research & Development Center, Kawasaki, Japan
Abstract :
High-voltage electron-beam writing has been successfully utilised to fabricate high-resolution and high-accuracy X-ray masks with vertical-wall gold patterns which have made it possible to print a ¿ ¿m resist pattern without any pattern size variation across steps.
Keywords :
electron beam applications; integrated circuit technology; large scale integration; masks; photolithography; IC technology; VLSI; X-ray masks; high-resolution; high-voltage electron-beam writing; resist pattern; submicron X-ray printing; vertical wall Au patterns;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19830200
