Title :
Characterization of Pt-Ru binary alloy thin films for work function tuning
Author :
Todi, R.M. ; Warren, A.P. ; Sundaram, K.B. ; Barmak, K. ; Coffey, K.R.
Author_Institution :
Univ. of Central Florida, Orlando, FL, USA
fDate :
7/1/2006 12:00:00 AM
Abstract :
This letter describes materials and electrical characterization of Pt-Ru binary alloy metal gate electrodes for control of the electrode work function. The work function of the Pt-Ru binary alloy system can be tuned over a wide range of 4.8-5.2 eV. The results indicate that the change of film properties, i.e., resistivity, work function, and crystal structure, with composition is consistent with the equilibrium phase diagram and that the work function in the face-centered cubic and hexagonal close-packed single-phase regions is only weakly dependent on composition, whereas a strong dependence is observed in the intermediate compositional range.
Keywords :
electrodes; metallic thin films; phase diagrams; platinum alloys; ruthenium alloys; work function; 4.8 to 5.2 eV; PtRu; binary alloy thin films; equilibrium phase diagram; metal gate electrodes; work function tuning; Annealing; Argon; Electrodes; Grain size; Inorganic materials; MOS devices; Platinum alloys; Silicon; Transistors; Tuning; Gate electrode; metal alloy; platinum–ruthenium (Pt–Ru); work function;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2006.876326
