Title :
Comparison of effective work function extraction methods using capacitance and current measurement techniques
Author :
Wen, Huang-Chun ; Choi, Rino ; Brown, George A. ; Böscke, Tim ; Matthews, Kenneth ; Harris, Harlan R. ; Choi, Kisik ; Alshareef, Husam N. ; Luan, Hongfa ; Bersuker, Gennadi ; Majhi, Prashant ; Kwong, Dim-Lee ; Lee, Byoung Hun
Author_Institution :
SEMATECH, Austin, TX, USA
fDate :
7/1/2006 12:00:00 AM
Abstract :
The effective work function (EWF) extracted on terraced oxide structures by capacitance-voltage-based techniques was compared with the work function calculated from the barrier height extracted by current-voltage measurements. The results show a reasonable correlation-within ± 0.1 eV-in the EWF values for various metal gate electrodes, validating both techniques for EWF extraction.
Keywords :
capacitance measurement; electric current measurement; work function; barrier height; capacitance-voltage-measurement; current-voltage measurements; effective work function extraction; metal gate electrodes; terraced oxide structures; CMOS technology; Capacitance measurement; Current measurement; Dielectric measurements; Dielectric substrates; Electrodes; High K dielectric materials; High-K gate dielectrics; Tunneling; Voltage; Barrier height; high-; metal gate; work function;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2006.876324
