Comparison of effective work function extraction methods using capacitance and current measurement techniques

Author

Wen, Huang-Chun ; Choi, Rino ; Brown, George A. ; Böscke, Tim ; Matthews, Kenneth ; Harris, Harlan R. ; Choi, Kisik ; Alshareef, Husam N. ; Luan, Hongfa ; Bersuker, Gennadi ; Majhi, Prashant ; Kwong, Dim-Lee ; Lee, Byoung Hun

Author_Institution

SEMATECH, Austin, TX, USA

Volume

27

Issue

7

fYear

2006

fDate

7/1/2006 12:00:00 AM

Firstpage

598

Lastpage

601

Abstract

The effective work function (EWF) extracted on terraced oxide structures by capacitance-voltage-based techniques was compared with the work function calculated from the barrier height extracted by current-voltage measurements. The results show a reasonable correlation-within ± 0.1 eV-in the EWF values for various metal gate electrodes, validating both techniques for EWF extraction.

Keywords

capacitance measurement; electric current measurement; work function; barrier height; capacitance-voltage-measurement; current-voltage measurements; effective work function extraction; metal gate electrodes; terraced oxide structures; CMOS technology; Capacitance measurement; Current measurement; Dielectric measurements; Dielectric substrates; Electrodes; High K dielectric materials; High-K gate dielectrics; Tunneling; Voltage; Barrier height; high-; metal gate; work function;

fLanguage

English

Journal_Title

Electron Device Letters, IEEE

Publisher

ieee

ISSN

0741-3106

Type

jour

DOI

10.1109/LED.2006.876324

Filename

1644839