DocumentCode
985921
Title
Control of internal stress of Co-Cr films deposited by facing targets sputtering
Author
Nakagawa, Shigeki ; Kitamoto, Yoshitaka ; Naoe, Masahiko
Author_Institution
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
Volume
26
Issue
1
fYear
1990
fDate
1/1/1990 12:00:00 AM
Firstpage
106
Lastpage
108
Abstract
The reduction of excessively large internal stress to zero has been succeeded by adjusting working gas pressure to the proper value in the range below 1 mtorr in a facing targets sputtering (FTS) system. In addition, the internal stress depends on the distance between facing targets in the FTS system. The origins of such a change of internal stress can be attributed to the bombarding effect by energetic particles recoiled at the target´s surface with a high ejection angle
Keywords
chromium alloys; cobalt alloys; ferromagnetic properties of substances; internal stresses; magnetic recording; magnetic thin films; sputter deposition; 1 mtorr; Co-Cr films; bombarding effect; ejection angle; energetic particles; facing targets sputtering; ferromagnet; internal stress control; working gas pressure; Argon; Internal stresses; Magnetic films; Polymer films; Pressure control; Semiconductor films; Sputtering; Stress control; Substrates; Video recording;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.50504
Filename
50504
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