DocumentCode :
985960
Title :
DC-magnetron sputtered CoNiTa for high density longitudinal recording
Author :
Khan, Mahbub R. ; Fisher, R.D. ; Heiman, Neil
Author_Institution :
Seagate Magnetics, Fremont, CA, USA
Volume :
26
Issue :
1
fYear :
1990
fDate :
1/1/1990 12:00:00 AM
Firstpage :
118
Lastpage :
120
Abstract :
Ternary cobalt alloy thin films were sputtered in a DC magnetron system. The alloys investigated consisted of (Co75-Ni25 )1-xTax where x was varied from 0 to 20 at.%. The magnetic properties and microstructure of these films prepared with RF substrate bias as a function of composition, film thickness, Cr underlayer thickness, and temperature are reported. Tantalum additions to the CoNi result in a 100 to 200 Oe increase in coercive force depending upon the film thickness. The CoNiTa system approaches the superparamagnetic state at a thickness greater than for the CoNi system. The grain size of the CoNiTa is somewhat smaller than that of CoNi at similar thickness values. The increase in coercive force and decrease in S* associated with small Ta additions to CoNi films can be explained on the basis of Ta segregation to grain boundaries decreasing the exchange interaction and modifying the grain size
Keywords :
cobalt alloys; coercive force; ferromagnetic properties of substances; grain size; magnetic recording; magnetic thin films; nickel alloys; scanning electron microscope examination of materials; sputtered coatings; superparamagnetism; tantalum alloys; CoNiTa; DC magnetron sputtering; RF substrate bias; SEM; Ta segregation; coercive force; exchange interaction; ferromagnet; grain boundaries; grain size; high density longitudinal recording; magnetic properties; microstructure; superparamagnetic state; Chromium; Cobalt alloys; Coercive force; Grain size; Magnetic films; Magnetic properties; Microstructure; Radio frequency; Sputtering; Substrates;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.50508
Filename :
50508
Link To Document :
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