DocumentCode :
985998
Title :
Static noise margin variation for sub-threshold SRAM in 65-nm CMOS
Author :
Calhoun, Benton H. ; Chandrakasan, Anantha P.
Author_Institution :
Dept. of Electr. & Comput. Eng., Virginia Univ., Charlottesville, VA
Volume :
41
Issue :
7
fYear :
2006
fDate :
7/1/2006 12:00:00 AM
Firstpage :
1673
Lastpage :
1679
Abstract :
The increased importance of lowering power in memory design has produced a trend of operating memories at lower supply voltages. Recent explorations into sub-threshold operation for logic show that minimum energy operation is possible in this region. These two trends suggest a meeting point for energy-constrained applications in which SRAM operates at sub-threshold voltages compatible with the logic. Since sub-threshold voltages leave less room for large static noise margin (SNM), a thorough understanding of the impact of various design decisions and other parameters becomes critical. This paper analyzes SNM for sub-threshold bitcells in a 65-nm process for its dependency on sizing, VDD, temperature, and local and global threshold variation. The VT variation has the greatest impact on SNM, so we provide a model that allows estimation of the SNM along the worst-case tail of the distribution
Keywords :
CMOS memory circuits; SRAM chips; integrated circuit design; integrated circuit modelling; 65 nm; CMOS process; SRAM device; static noise margin variation; CMOS logic circuits; Capacitance; Circuit noise; Digital circuits; Inverters; Logic circuits; Probability distribution; Random access memory; Temperature dependence; Voltage; SRAM; Sub-threshold; process variation; static noise margin; sub-threshold memory; voltage scaling;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.2006.873215
Filename :
1644879
Link To Document :
بازگشت