On the macroparticle flux from vacuum arc cathode spots

Author

Anders, Simone ; Anders, André ; Yu, Kin Man ; Yao, Xiang Y. ; Brown, Ian G.

Author_Institution

Lawrence Berkeley Lab., California Univ., Berkeley, CA, USA

Volume

21

Issue

5

fYear

1993

fDate

10/1/1993 12:00:00 AM

Firstpage

440

Lastpage

446

Abstract

The macroparticle contamination of vacuum-arc-deposited thin films generated by a plasma source with an optional axial magnetic field is studied. Emphasis is placed on the macroparticle flux near the discharge axis. The arc current, metal species, deposition system geometry and axial magnetic field strength are varied. Distribution functions for macroparticles of Pb, Ag, Cu, Pt, W, and Ni are determined, normalized to the film thickness deposited or the charge transferred. The application of the axial magnetic field leads to a considerable reduction of the normalized macroparticle flux since the plasma is effectively focused by the field, whereas the macroparticle production is not influenced. The macroparticle content normalized to the deposited film thickness is reduced to about 20-35% of that without an additional magnetic field

Keywords

Langmuir probes; arcs (electric); cathodes; plasma deposition; plasma diagnostics; plasma production; plasma transport processes; vacuum deposition; Ag; Cu; Pb; Pt; W; arc current; axial magnetic field; charge transfer; deposition system geometry; discharge axis; film thickness; macroparticle contamination; macroparticle content; macroparticle flux; magnetic field strength; metal species; plasma source; vacuum arc cathode spots; vacuum-arc-deposited thin films; Cathodes; Contamination; Distribution functions; Fault location; Geometry; Lead; Magnetic fields; Magnetic films; Plasma sources; Vacuum arcs;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.249623

Filename

249623