Title :
On the study of interdiffusion in thin films by magnetic methods
Author_Institution :
Technical Physics Center, Iasi, Romania
fDate :
11/1/1981 12:00:00 AM
Abstract :
The interdiffusion in Ni-Cu and Ni-Mn thin films has been studied by means of their magnetic moment and its variation with temperature. A new calculation method of diffusion coefficients, based on the dependence of magnetic moments upon the diffusion time, has been proposed. It is shown, that the diffusion coefficient determined in this way have a global meaning of several diffusion mechanisms.
Keywords :
Magnetic films; Annealing; Copper; Crystallization; Grain boundaries; Lattices; Magnetic films; Nickel; Substrates; Temperature; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1981.1061664
