Title :
A novel GaAs FET with double camel-like gate structure
Author_Institution :
Dept. of Phys., Nat. Kaohsiung Normal Univ., Taiwan
fDate :
7/1/2005 12:00:00 AM
Abstract :
Extremely high potential barrier height and gate turn-on voltage of a novel GaAs field-effect transistor with n/sup +//p/sup +//n/sup +//p/sup +//n double camel-like gate structure are demonstrated. The maximum electric field and potential barrier height of the double camel-like gate are substantially enhanced by the addition of another n/sup +//p/sup +/ layers in gate region, as compared with the conventional n/sup +//p/sup +//n single camel-like gate. For a 1×100 μm2 device, a potential barrier height up to 2.741 V is obtained. Experimentally, a high gate turn-on voltage up to +4.9 V is achieved because two reverse-biased junctions of the double camel-like gate absorb part of positive gate voltage. In addition, the transistor action shows a maximum saturation current of 730 mA/mm and an extrinsic transconductance of 166 mS/mm.
Keywords :
III-V semiconductors; field effect transistors; gallium arsenide; GaAs; double camel-like gate structure; electric field; field effect transistor; gate region; gate turn-on voltage; n+/p+ layers; potential barrier height; reverse-biased junctions; saturation current; Double-gate FETs; Electric potential; Electrodes; Gallium arsenide; Inverters; MESFETs; MODFET circuits; Ohmic contacts; Transconductance; Voltage; Camel-like gate; GaAs; field-effect transistor; potential barrier height; turn-on voltage;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2005.851039