Title :
Effect of Neutron Irradiation on High Voltage 4H-SiC Vertical JFET Characteristics: Characterization and Modeling
Author :
Popelka, S. ; Hazdra, Pavel ; Sharma, Ritu ; Zahlava, V. ; Vobecky, J.
Author_Institution :
Dept. of Microelectron., Czech Tech. Univ. in Prague, Prague, Czech Republic
Abstract :
The effect of neutron irradiation on commercial vertical high voltage normally-OFF SiC power N-JFETs was investigated. JFETs were irradiated with 1 MeV neutron equivalent fluences up to 4×1014 cm-2. Measurement showed that fast neutrons introduce deep levels acting mostly as deep acceptor centers. These centers gradually compensate lightly doped channel and drift regions of JFETs. As a result, characteristics are deteriorated, the JFET threshold voltage gradually increases and transconductance is lowered. At fluences higher than 4×1014 cm-2, the low doped n-regions are fully compensated and transistor loses its functionality. The 2D physical model of JFET in ATLAS simulator was developed and calibrated including the neutron irradiation effects. Simulation showed a good agreement with experimental data. This confirmed that carrier removal in the channel and drift region by acceptors centers introduced by neutrons is a dominant reason of SiC JFET degradation.
Keywords :
deep levels; doping; junction gate field effect transistors; neutron activation analysis; neutron flux; semiconductor device models; silicon compounds; wide band gap semiconductors; ATLAS simulator; JFET degradation; SiC; carrier removal; deep acceptor center; deep level; drift region; electron volt energy 1 MeV; high voltage 4H-silicon carbide vertical JFET characteristic; junction gate field-effect transistor; lightly doped channel; low doped n-region; neutron equivalent fluence; neutron irradiation effect; threshold voltage; transconductance; vertical high voltage normally-off power N-JFET; Doping; JFETs; Neutrons; Radiation effects; Silicon carbide; Junction field effect transistor (JFET); neutrons; radiation effects; silicon carbide (SiC);
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.2014.2358957