Title :
Co-Cr films for perpendicular recording
Author :
Wielinga, T. ; Lodder, J.C.
Author_Institution :
Twente University of Technology, Enschede, The Netherlands
fDate :
11/1/1981 12:00:00 AM
Abstract :
Co-Cr films were prepared by means of RF-sputtering. The dependence of the magnetic parameters on the sputter conditions was investigated. It was found that for increasing Ar-pressure the c-axis of the hcp-structure gradually declines from normal to in-plane orientation. An optimum for the sputter voltage is found. The coercivity increases with decreasing target-substrate distance and this is probably due to surface heating by electron bombardment from the Ar-plasma. The recording characteristics of these Co-Cr films were then investigated by means of standstill recording experiments. A 6.7 μm thick permalloy single-pole head (SPH) was used for creating a head print in a 1 μm thick Co-Cr layer. The flux reversals are detected by means of a magneto-resistive transducer (MRT). The response was analyzed, using a analytical method for calculating the magnetization distribution in the Co-Cr layer. For this purpose the head field of the SPH was also determined with the same MRT.
Keywords :
Magnetic anisotropy; Magnetic films; Sputtering; Coercive force; Electrons; Heating; Magnetic analysis; Magnetic films; Magnetic flux; Magnetic heads; Perpendicular magnetic recording; Transducers; Voltage;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1981.1061732