• DocumentCode
    988222
  • Title

    On the validity of the parabolic effective-mass approximation for the I-V calculation of silicon nanowire transistors

  • Author

    Wang, Jing ; Rahman, Anisur ; Ghosh, Avik ; Klimeck, Gerhard ; Lundstrom, Mark

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
  • Volume
    52
  • Issue
    7
  • fYear
    2005
  • fDate
    7/1/2005 12:00:00 AM
  • Firstpage
    1589
  • Lastpage
    1595
  • Abstract
    This paper examines the validity of the widely used parabolic effective-mass approximation for computing the current-voltage (I-V) characteristics of silicon nanowire transistors (SNWTs). The energy dispersion relations for unrelaxed Si nanowires are first computed by using an sp3d5s* tight-binding (TB) model. A seminumerical ballistic field-effect transistor model is then adopted to evaluate the I-V characteristics of the (n-type) SNWTs based on both a TB dispersion relation and parabolic energy bands. In comparison with the TB approach, the parabolic effective-mass model with bulk effective-masses significantly overestimates SNWT threshold voltages when the wire width is <3 nm, and ON-currents when the wire width is <5 nm. By introducing two analytical equations with two tuning parameters, however, the effective-mass approximation can well reproduce the TB I-V results even at a ∼1.36-nm wire width.
  • Keywords
    circuit simulation; elemental semiconductors; field effect transistors; function approximation; nanowires; numerical analysis; semiconductor device models; silicon; tight-binding calculations; I-V calculation; I-V characteristics; SNWT threshold voltages; Si; TB dispersion relation; ballistic field-effect transistor model; bandstructure; energy dispersion relations; nonparabolicity; parabolic effective mass approximation; parabolic effective mass model; parabolic energy bands; quantum confinement; silicon nanowire transistors; tight-binding model; Dispersion; Electrostatics; Equations; FETs; MOSFET circuits; Potential well; Silicon; Threshold voltage; Tuning; Wire; Bandstructure; effective-mass; field-effect transistor (FET); nanowire; nonparabolicity; quantum confinement; tight binding;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2005.850945
  • Filename
    1459123