Application of conformal mapping approximation techniques: parallel conductors of finite dimensions

Author

Pesonen, Nadine ; Kahn, Walter K. ; Allen, Richard A. ; Cresswell, Michael W. ; Zaghloul, Mona E.

Author_Institution

MEMS Sensors Group, Nat. Res. Center of Finland, Finland

Volume

53

Issue

3

fYear

2004

fDate

6/1/2004 12:00:00 AM

Firstpage

812

Lastpage

821

Abstract

This paper describes a novel approach to the application of conformal mapping to capacitance evaluation. A particular structure composed of an array of identical lines and located below a conductive plate is studied. Results show the application of conformal mapping can reduce computing time when using three-dimensional electrostatic modeling and it can be the basis of algorithms of practical applications, especially in the semiconductor industry.

Keywords

capacitance measurement; conductors (electric); conformal mapping; integrated circuit interconnections; capacitance evaluation; conductive plate; conformal mapping approximation techniques; finite dimensions; fringing effect; parallel conductors; three-dimensional electrostatic modeling; Capacitance; Capacitive sensors; Conductors; Conformal mapping; Electronics industry; Geometry; Lithography; NIST; Optical sensors; Silicon; Capacitance evaluation; conformal mapping; fringing effect;

fLanguage

English

Journal_Title

Instrumentation and Measurement, IEEE Transactions on

Publisher

ieee

ISSN

0018-9456

Type

jour

DOI

10.1109/TIM.2004.827065

Filename

1299146