Title :
Selective microelectrodeposition of Ni-Fe patterns
Author :
Wagner, Udo ; Zilk, Anita
Author_Institution :
Siemens AG Research Laboratories, West Germany
fDate :
5/1/1982 12:00:00 AM
Abstract :
Ni-Fe patterns of reproducible high quality for integrated thin film heads can be made by selective microelectrodeposition. A Ni-Fe bath characterized by improved microthrowing and long bath operation time has been used for this technique. Precise replication of mask profile, uniformity of thickness and chemical composition, and favorable magnetic properties of the microstructures of varying size are significant features of the technique.
Keywords :
Electrochemical processes; Integrated magnetic devices; Magnetic recording/reading heads; Dry etching; Iron; Magnetic films; Magnetic heads; Magnetic properties; Radio frequency; Resists; Sputter etching; Substrates; Wet etching;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1982.1061936
