DocumentCode
989297
Title
Selective microelectrodeposition of Ni-Fe patterns
Author
Wagner, Udo ; Zilk, Anita
Author_Institution
Siemens AG Research Laboratories, West Germany
Volume
18
Issue
3
fYear
1982
fDate
5/1/1982 12:00:00 AM
Firstpage
877
Lastpage
879
Abstract
Ni-Fe patterns of reproducible high quality for integrated thin film heads can be made by selective microelectrodeposition. A Ni-Fe bath characterized by improved microthrowing and long bath operation time has been used for this technique. Precise replication of mask profile, uniformity of thickness and chemical composition, and favorable magnetic properties of the microstructures of varying size are significant features of the technique.
Keywords
Electrochemical processes; Integrated magnetic devices; Magnetic recording/reading heads; Dry etching; Iron; Magnetic films; Magnetic heads; Magnetic properties; Radio frequency; Resists; Sputter etching; Substrates; Wet etching;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1982.1061936
Filename
1061936
Link To Document