• DocumentCode
    9898
  • Title

    Emission Characteristics of Surface Microdischarge in Atmospheric-Pressure He/N2 Mixture

  • Author

    Dong Li ; Dingxin Liu ; Qiuyue Nie ; Dehui Xu ; Qiaosong Li ; Kong, Michael G.

  • Author_Institution
    State Key Lab. of Electr. Insulation & Power Equip., Xi´an Jiaotong Univ., Xi´an, China
  • Volume
    42
  • Issue
    10
  • fYear
    2014
  • fDate
    Oct. 2014
  • Firstpage
    2640
  • Lastpage
    2641
  • Abstract
    The surface microdischarge in atmosphericpressure He/N2 mixture is studied with an emphasis on its emission characteristics. It is found that the emission intensity and the pattern shape are strongly dependent on the N2 concentration. The UV emission intensity increases by a factor of nine with the N2 concentration up to 5%, after that it decreases moderately. Meanwhile, the luminous pattern expands and then shrinks from grounded mesh edge to the mesh center in the positive half-cycle, while it gradually brightens and then darkens in the central region of a mesh for the negative half-cycle, which is mainly attributed to the distribution of surface charge. In the case of [N2] = 2%-5%, the UV-Vis emission intensity is stronger and the emission pattern is comparable to spatial homogenous, thus benefiting the light emission applications.
  • Keywords
    gas mixtures; helium; nitrogen; plasma diagnostics; plasma transport processes; spectral line intensity; surface charging; surface discharges; He-N2; UV-Vis emission intensity; atmospheric-pressure He-N2 mixture; grounded mesh edge; luminous pattern; negative half-cycle; pressure 1 atm; surface charge; surface microdischarge; Discharges (electric); Educational institutions; Electrodes; Helium; Plasmas; Shape; Surface discharges; Atmospheric pressure; He/N₂ mixture; He/N2 mixture; emission pattern; surface microdischarge; surface microdischarge.;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2014.2321431
  • Filename
    6817580