DocumentCode :
990500
Title :
The Silicon Dioxide Solution
Author :
Riordan, Michael
Author_Institution :
Stanford Univ., Santa Cruz
Volume :
44
Issue :
12
fYear :
2007
Firstpage :
51
Lastpage :
56
Abstract :
The planar process also made it easy to interconnect neighboring transistors on a wafer, paving the way to another Fairchild achievement: the first commercial integrated circuits. As other companies realized the great advantages of planar technology and began adopting it on their own production lines, Hoerni´s elegant idea helped to establish Silicon Valley as the microelectronics epicenter of the world.
Keywords :
elemental semiconductors; integrated circuit interconnections; integrated circuit manufacture; silicon; transistors; wafer-scale integration; Hoerni´s planar technology; Si; integrated circuit manufacturing; microelectronics; semiconductor industry; silicon; transistors interconnection; Bridge circuits; Cellular phones; Erbium; Fasteners; Humans; Plastics; Printing; Production; Silicon compounds; Switches;
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/MSPEC.2007.4390023
Filename :
4390023
Link To Document :
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