DocumentCode
990500
Title
The Silicon Dioxide Solution
Author
Riordan, Michael
Author_Institution
Stanford Univ., Santa Cruz
Volume
44
Issue
12
fYear
2007
Firstpage
51
Lastpage
56
Abstract
The planar process also made it easy to interconnect neighboring transistors on a wafer, paving the way to another Fairchild achievement: the first commercial integrated circuits. As other companies realized the great advantages of planar technology and began adopting it on their own production lines, Hoerni´s elegant idea helped to establish Silicon Valley as the microelectronics epicenter of the world.
Keywords
elemental semiconductors; integrated circuit interconnections; integrated circuit manufacture; silicon; transistors; wafer-scale integration; Hoerni´s planar technology; Si; integrated circuit manufacturing; microelectronics; semiconductor industry; silicon; transistors interconnection; Bridge circuits; Cellular phones; Erbium; Fasteners; Humans; Plastics; Printing; Production; Silicon compounds; Switches;
fLanguage
English
Journal_Title
Spectrum, IEEE
Publisher
ieee
ISSN
0018-9235
Type
jour
DOI
10.1109/MSPEC.2007.4390023
Filename
4390023
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