• DocumentCode
    990500
  • Title

    The Silicon Dioxide Solution

  • Author

    Riordan, Michael

  • Author_Institution
    Stanford Univ., Santa Cruz
  • Volume
    44
  • Issue
    12
  • fYear
    2007
  • Firstpage
    51
  • Lastpage
    56
  • Abstract
    The planar process also made it easy to interconnect neighboring transistors on a wafer, paving the way to another Fairchild achievement: the first commercial integrated circuits. As other companies realized the great advantages of planar technology and began adopting it on their own production lines, Hoerni´s elegant idea helped to establish Silicon Valley as the microelectronics epicenter of the world.
  • Keywords
    elemental semiconductors; integrated circuit interconnections; integrated circuit manufacture; silicon; transistors; wafer-scale integration; Hoerni´s planar technology; Si; integrated circuit manufacturing; microelectronics; semiconductor industry; silicon; transistors interconnection; Bridge circuits; Cellular phones; Erbium; Fasteners; Humans; Plastics; Printing; Production; Silicon compounds; Switches;
  • fLanguage
    English
  • Journal_Title
    Spectrum, IEEE
  • Publisher
    ieee
  • ISSN
    0018-9235
  • Type

    jour

  • DOI
    10.1109/MSPEC.2007.4390023
  • Filename
    4390023