DocumentCode :
991424
Title :
Recovery and Drift Dynamics of Resistance and Threshold Voltages in Phase-Change Memories
Author :
Ielmini, Daniele ; Lacaita, Andrea L. ; Mantegazza, Davide
Author_Institution :
Dipt. di Elettronica e Informazione, Politecnico di Milano
Volume :
54
Issue :
2
fYear :
2007
Firstpage :
308
Lastpage :
315
Abstract :
The electronic behavior of the chalcogenide material used in phase-change memory (PCM) plays a key role in defining the operation voltages and times of the memory cell. In particular, the threshold voltage for electronic switching of the amorphous chalcogenide determines the boundary between programming and readout operation, while its resistance allows the recognition of the bit status. This paper present a time-resolved analysis of threshold voltage and resistance in a PCM. Both dynamics of threshold voltage and resistance display a fast transient, named recovery behavior, in the first 30 ns after programming. A slower, nonsaturating drift transient is found for longer times. The two transients are discussed referring to electronic and structural rearrangements in the amorphous chalcogenide. Finally, the impact on the device level is considered
Keywords :
chalcogenide glasses; phase change materials; random-access storage; amorphous chalcogenide; chalcogenide materials; drift dynamics; electronic switching; nonsaturating drift transient; nonvolatile memories; phase-change memories; recovery behavior; threshold switching; threshold voltages; time-resolved analysis; Amorphous materials; Crystalline materials; Crystallization; Dynamic programming; Nonvolatile memory; Phase change materials; Phase change memory; Pulse measurements; Senior members; Threshold voltage; Chalcogenide materials; nonvolatile memories; phase-change memories (PCMs); threshold switching;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2006.888752
Filename :
4067188
Link To Document :
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