DocumentCode :
991549
Title :
Magnetic properties of thin films prepared by continuous vapor deposition
Author :
Nakamura, K. ; Ohta, Y. ; Itoh, A. ; Hayashi, C.
Author_Institution :
ULVAC Corporation, Chiba, Japan.
Volume :
18
Issue :
6
fYear :
1982
fDate :
11/1/1982 12:00:00 AM
Firstpage :
1077
Lastpage :
1079
Abstract :
Magnetic thin films deposited by the oblique incidence evaporation are considered to have excellent characteristics for high density recording medium. The magnetic properties and microstructures of these films prepared continuously with a roll coater have been investigated. In continuous vapor deposition, two different modes of deposition processes are considered, corresponding to substrate running direction. The HIN (high incidence nucleation) direction implies that deposition initiates at higher incidence angle and shifts to lower incidence angle. The LIN (low incidence nucleation) direction is the opposite. Hc and Ir/Is of the films by HIN direction have larger values than those by LIN direction in the same region of incidence angle. According to TEM micrographs of thin films by HIN direction, it is observed that elongated nucleation is taken place in higher incidence angle direction and subsequently grown in same direction.
Keywords :
Magnetic films/devices; Chemical vapor deposition; Coercive force; Cooling; Iron; Magnetic films; Magnetic flux; Magnetic properties; Magnetic recording; Sputtering; Substrates;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1982.1062143
Filename :
1062143
Link To Document :
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