High Curie temperature vanadium containing films for 8µm period magnetic bubble devices

Films of the nominal composition (SmLuCa)3(FeVSi)5O12have been grown for 8 μm period magnetic bubble devices, supporting bubbles of diameter close to 1.7 μm. These films were grown from PbO-V2O5flux. Since, in these films the dilution of iron is mainly through V⁵⁺, these films have a high Curie temperature (495-516°K). Silicon is added to match the film lattice parameter with that of the GGG substrate. The system is very flexible in terms of the bubble properties that can be obtained for the desired bubble size. The various bubble properties of these films in the temperature range of-50°C to +150°C are described. Because of their high Curie temperatures these films are a suitable candidate for applications requiring device operation at high temperatures.