Title :
Short-channel modeling of bulk accumulation MOSFETs
Author :
Murali, Raghunath ; Austin, Blanca L. ; Wang, Lihui ; Meindl, James D.
Author_Institution :
Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
fDate :
6/1/2004 12:00:00 AM
Abstract :
Physically based short-channel effect (SCE) models are derived for bulk accumulation MOSFETs. Using the proposed models, threshold voltage rolloff, subthreshold swing, and subthreshold current can be accurately calculated; this enables physical insights into device scaling behavior, and prediction of scaling limits. The models enable optimization of accumulation MOSFETs, resulting in small SCE, and low process sensitivity. The models are equally applicable to inversion MOSFETs, and allow easy comparison between accumulation and inversion MOSFETs. Novel application areas of accumulation MOSFETs are identified where they perform better than inversion MOSFETs (better on-current and lower SCE for a given off-current). With mid-band metal gate, accumulation MOSFETs perform better than inversion MOSFETs in ultra low power applications. For poly gate CMOS, accumulation MOSFETs perform better than inversion MOSFETs in low standby power applications.
Keywords :
MOSFET; accumulation layers; inversion layers; low-power electronics; semiconductor device models; SCE models; bulk accumulation MOSFET; buried channel; device scaling; inversion MOSFET; low standby power applications; midband metal gate; polygate CMOS; process sensitivity; scaling limit; short-channel effect; short-channel modeling; subthreshold current; subthreshold swing; threshold voltage rolloff; ultra low power applications; CMOS technology; Conducting materials; Counting circuits; MOSFETs; Microelectronics; Predictive models; Subthreshold current; Terminology; Threshold voltage; Transconductance; Accumulation; MOSFET; buried channel; inversion; short-channel; threshold voltage;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2004.828276