Title :
Development of screen-printed silicon solar cells with high fill factors on 100 Ω/sq emitters
Author :
Hilali, Mohamed M. ; Rohatgi, Ajeet ; Asher, Sally
Author_Institution :
Univ. Center of Excellence for Photovoltaics Res. & Educ., Atlanta, GA, USA
fDate :
6/1/2004 12:00:00 AM
Abstract :
High-quality DuPont screen-printed Ag contacts were achieved on high sheet-resistance emitters (100 Ω/sq) by rapid alloying of PV168 Ag paste. Excellent specific contact resistance (∼1 mΩ-cm2) in conjunction with high fill factor (FF) (0.775) were obtained on 100 Ω/sq emitters by a 900°C spike firing of the PV168 paste in a belt furnace. The combination of the alloying characteristics of the PV168 Ag paste and optimized single-step rapid low-thermal budget firing resulted in a cost-effective manufacturable process for high-efficiency Si solar cells. In addition, the co-fired 100 Ω/sq cell showed a noticeable improvement of ∼0.5% in absolute efficiency over a conventional co-fired 45 Ω/sq emitter cell. Lighter doping in the 100 Ω/sq emitter cell resulted in better blue-response compared to the conventional cell, contributing to ∼1.3 mA/cm2 improvement in short-circuit current. Improved surface passivation on 100 Ω/sq emitter cell resulted in additional 0.6 mA/cm2 increase in Jsc, 15-mV higher Voc, and a 0.6% increase in absolute cell efficiency. Front grid design optimization resulted in a FF of 0.780, and a further improvement in cell efficiency to reach 17.4%.
Keywords :
contact resistance; elemental semiconductors; ohmic contacts; photovoltaic cells; semiconductor device manufacture; silicon; silver; solar cells; 100 ohm; 900 C; DuPont Ag contacts; PV168 Ag paste; Si; alloy characteristics; belt furnace; blue-response; contact resistance; fill factors; front grid design optimization; high-efficiency Si solar cells; high-quality Ag contacts; optimized single-step rapid low-thermal budget firing; rapid alloying; screen-printed Ag contacts; screen-printed silicon solar cells; sheet-resistance emitters; short-circuit current; spike firing; surface passivation; Alloying; Belts; Contact resistance; Design optimization; Doping; Furnaces; Manufacturing processes; Passivation; Photovoltaic cells; Silicon; High sheet-resistance emitters; photovoltaic cells; screen-printed contacts; silicon;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2004.828280