• DocumentCode
    993000
  • Title

    MC simulation of strained-Si MOSFET with full-band structure and quantum correction

  • Author

    Fan, Xiao-Feng ; Wang, Xin ; Winstead, Brian ; Register, Leonard F. ; Ravaioli, Umberto ; Banerjee, Sanjay K.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
  • Volume
    51
  • Issue
    6
  • fYear
    2004
  • fDate
    6/1/2004 12:00:00 AM
  • Firstpage
    962
  • Lastpage
    970
  • Abstract
    A new two-dimensional full-band Monte Carlo simulator, "Monte Carlo University of Texas" (MCUT) is introduced and described in this paper. MCUT combines some of the best features of semiclassical MC device simulation including full-band structure and flexibility of scattering processes, with generality of material composition and the ability to address degeneracy breaking among energy valleys and the associated effects on scattering and transport due to quantum confinement and strain effects. The latter capability derives from extension of a prior crystal-momentum-independent self-consistent Poisson-Schrödinger-based quantum corrected potential, to a valley dependent quantum correction via, in part, a new modeling concept of "effective strain" within the full-band structure code. Low field mobility simulation results for large tensile strained-Si channel nMOSFETs and unstrained-Si channel nMOSFETs device are compared with other simulation methods and experimental data to demonstrate the effectiveness of the approach, and the abilities to simulate high-field transport and transport in devices of a few 10s of nanometer channel lengths are briefly demonstrated.
  • Keywords
    MOSFET; Monte Carlo methods; Poisson equation; Schrodinger equation; circuit CAD; elemental semiconductors; nanoelectronics; semiconductor device models; silicon; MC simulation; MCUT; Monte Carlo University of Texas; Poisson-Schrodinger-based potential; SiGe heterostructures; crystal-momentum-independent potential; degeneracy breaking; effective strain; energy valleys; full-band Monte Carlo simulator; full-band structure; high-field transport; low field mobility simulation; material composition; metal-oxide-semiconductor field-effect transistors; nanometer channel lengths; quantum confinement; quantum corrected potential; quantum effects; scattering processes; self-consistent potential; semiclassical MC device simulation; strain effects; strained-Si MOSFET; strained-silicon; tensile strained-Si channel nMOSFET; unstrained-Si channel nMOSFET; valley dependent quantum correction; Capacitive sensors; Electron mobility; Germanium silicon alloys; Light scattering; MOSFET circuits; Monte Carlo methods; Particle scattering; Potential well; Quantum computing; Silicon germanium; Full-band Monte Carlo; MC; MOSFET simulations; SiGe heterostructures; quantum effects; strained-silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2004.828296
  • Filename
    1300832