Title :
Microprocessing of GaAs cylindrical columns for integrated optical device fabrication by Cl2-Ar reactive ion etching
Author :
Yamada, Hiroyoshi ; Ito, H. ; Inaba, Hiromi
Author_Institution :
Tohoku University, Research Institute of Electrical Communication, Sendai, Japan
Abstract :
We report a reactive ion etching (RIE) technique employing a Cl2-Ar gas mixture for GaAs integrated optical device fabrication. This RIE enables one to process GaAs and AlGaAs wafers independently of crystal orientation. Etching characteristics and a demonstration of the vertical etching of GaAs wafers in the shape of a cylindrical column are described.
Keywords :
III-V semiconductors; gallium arsenide; integrated circuit technology; integrated optics; optical workshop techniques; optoelectronic devices; sputter etching; AlGaAs wafers; Cl2-Ar reactive ion etching; GaAs cylindrical columns; IC technology; III-V semiconductor; RIE; integrated optical device fabrication; optical workshop techniques; optoelectronic devices; vertical etching;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19840408
