DocumentCode :
993683
Title :
1-μm Enhancement Mode GaAs N-Channel MOSFETs With Transconductance Exceeding 250 mS/mm
Author :
Rajagopalan, K. ; Droopad, R. ; Abrokwah, J. ; Zurcher, P. ; Fejes, P. ; Passlack, M.
Author_Institution :
Freescale Semicond. Inc, Tempe, AZ
Volume :
28
Issue :
2
fYear :
2007
Firstpage :
100
Lastpage :
102
Abstract :
In this letter, 1-mum GaAs-based enhancement-mode n-channel devices with channel mobility of 5500 cm2/Vmiddots and g m exceeding 250 mS/mm have been fabricated. The measured device parameters including threshold voltage Vth, maximum extrinsic transconductance gm, saturation current Idss , on-resistance Ron, and gate current are 0.11 V, 254 mS/mm, 380 mA/mm, 4.5 Omegamiddotmm, and < 56 pA for a first wafer and 0.08 V, 229 mS/mm, 443 mA/mm, 4.5 Omegamiddotmm, and < 90 pA for a second wafer, respectively. With an intrinsic transconductance gmi of 434 mS/mm, GaAs enhancement-mode MOSFETs have reached expected intrinsic device performance
Keywords :
III-V semiconductors; MOSFET; gallium compounds; wide band gap semiconductors; 0.08 V; 0.11 V; 1 micron; GaAs; compound semiconductor; enhancement mode MOSFET; n-Channel MOSFET; Buffer layers; Electron mobility; Gallium arsenide; Indium phosphide; MOSFETs; Manufacturing; Substrates; Superlattices; Threshold voltage; Transconductance; Compound semiconductor; GaAs; MOSFETs; enhancement mode; high-mobility channel;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2006.889502
Filename :
4068967
Link To Document :
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