Title :
Permanent magnet configurations for magnetic-field-enhanced RIE
Author :
Yonnet, Jean-Paul ; Picard, Alain
Author_Institution :
Lab. d´´Electrotech. de Grenoble, Saint Martin d´´Heres, France
fDate :
1/1/1990 12:00:00 AM
Abstract :
Several permanent magnet systems have been developed to enhance the reactive ion etching (RIE) of wafers. A new system, running with rotating bar-shaped magnets, that provides a traveling magnetic field in the wafer area is presented. This configuration is well adapted to obtaining fast and uniform etching
Keywords :
magnetic fields; permanent magnets; sputter etching; magnetic-field-enhanced RIE; permanent magnet systems; reactive ion etching; rotating bar-shaped magnets; traveling magnetic field; uniform etching; Electrons; Etching; Inductors; Magnetic confinement; Magnetic fields; Permanent magnets; Plasma applications; Plasma confinement; Plasma density; Very large scale integration;
Journal_Title :
Magnetics, IEEE Transactions on
