Title :
Simulation of Gas-Phase Kinetics in CHF3:H2: O2 Mixtures
Author :
Voloshin, Dmitry G. ; Klopovskiy, Konstantin S. ; Mankelevich, Yuri A. ; Popov, Nikolay A. ; Rakhimova, Tatyana V. ; Rakhimov, Alexander T.
Author_Institution :
Moscow State Univ., Moscow
Abstract :
A gas-phase reaction model for and mixtures was developed. Self-consistent electron impact cross-section set for was introduced. The original total and partial dissociation cross sections were received. A developed gas-phase kinetic scheme was tested on the experimental data. An important role of the chain reactions in the kinetics of F and H atoms and radicals was revealed.
Keywords :
electron impact dissociation; gas mixtures; hydrogen; organic compounds; oxygen; plasma chemistry; plasma simulation; chain reactions; gas-phase kinetics; partial dissociation cross sections; plasma-chemical simulation; self-consistent electron impact cross-section set; trifluoromethane-H2-O2 mixtures; Electrons; Etching; Hafnium; Hydrogen; Kinetic theory; Plasma applications; Plasma measurements; Plasma simulation; Polymer films; Testing; $hbox{CHF}_{3}$ electron impact cross-section set; $hbox{CHF}_{3}$-contained plasma; plasma-chemical simulation;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2007.906780
