DocumentCode :
995525
Title :
The influence of the thermal equilibrium approximation on the accuracy of classical two-dimensional numerical modeling of silicon submicrometer MOS transistors
Author :
Meinerzhagen, Bernd ; Engl, Walter L.
Author_Institution :
Inst. fur Theor. Elektrotech., Aachen, West Germany
Volume :
35
Issue :
5
fYear :
1988
fDate :
5/1/1988 12:00:00 AM
Firstpage :
689
Lastpage :
697
Abstract :
Classical semiconductor equations are based on the thermal equilibrium approximation. Limitations introduced by this approximation for the 2-D numerical modeling of n-channel silicon submicrometer MOS transistors are investigated. It is shown that the classical equations are accurate for predicting drain current for devices with effective channel lengths as small as 0.3 μm. However, accurate substrate current modeling requires a more detailed level of simulation even for devices with longer channel lengths. The solution of the energy conservation equation is discussed
Keywords :
insulated gate field effect transistors; semiconductor device models; 0.3 micron; Si; channel lengths; classical two-dimensional numerical modeling; drain current; energy conservation equation; n-channel MOST; semiconductor equations; submicrometer MOS transistors; substrate current modeling; thermal equilibrium approximation; Electrons; Energy conservation; Equations; Heating; Lattices; MOS devices; MOSFETs; Numerical models; Silicon; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.2514
Filename :
2514
Link To Document :
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