Title :
Equilibrium profiles for RF-plasma sources with ponderomotive forces
Author :
DiPeso, Gregory ; Rognlien, Thomas D. ; Vahedi, Vahid ; Hewett, Dennis W.
Author_Institution :
Lawrence Livermore Nat. Lab., CA, USA
fDate :
8/1/1995 12:00:00 AM
Abstract :
An analysis is given of the influence of the electron ponderomotive force on the equilibrium plasma profiles of partially ionized, radio frequency discharge sources, The ponderomotive force can be written as a gradient of a potential varying with the square of the RF field in the plasma and is largest for electrons, The impact of this electron ponderomotive force on density and electrostatic potential profiles is demonstrated using a one-dimensional analytic model with supporting numerical solutions and a two dimensional fluid simulation. For nearly collisionless plasmas the ponderomotive force is valid when ωceh/ω<1 where ωce h is the electron cyclotron frequency due to the RF magnetic field and ω is the RF driving frequency, In processing plasmas with parameters that satisfy this validity criteria, the equilibrium density profiles are weakly modified, For nearly collisionless processing plasmas with parameters such that ωceh /ω>1, the ponderomotive force, is modified by other nonlinear force terms that need to be evaluated
Keywords :
discharges (electric); high-frequency discharges; plasma density; plasma diagnostics; plasma production; plasma simulation; simulation; RF driving frequency; RF magnetic field; RF-plasma sources; collisionless processing plasmas; density; electron cyclotron frequency; electron ponderomotive force; electrostatic potential profiles; equilibrium density profiles; equilibrium plasma profiles; equilibrium profiles; numerical solutions; one-dimensional analytic model; partially ionized radio frequency discharge sources; two dimensional fluid simulation; Analytical models; Electrons; Electrostatic analysis; Fault location; Numerical models; Plasma density; Plasma materials processing; Plasma simulation; Plasma sources; Radio frequency;
Journal_Title :
Plasma Science, IEEE Transactions on