Title :
Three-dimensional electromagnetic PIC model of a compact ECR plasma source
Author :
Gopinath, Venkatesh P. ; Grotjohn, Timothy A.
Author_Institution :
Dept. of Electr. Eng., Michigan State Univ., East Lansing, MI, USA
fDate :
8/1/1995 12:00:00 AM
Abstract :
A three-dimensional electromagnetic particle-in-cell (PIC) model is developed and used to model a compact ECR plasma source. The finite-difference time-domain (FDTD) technique is used to model the microwave fields which excite the plasma at 2.45 GHz. The PIC technique is used to model the dynamics of both the electrons and ions in the plasma. The grid structure used is constructed using the cylindrical coordinate system. Techniques which permit stable numerical solutions in the cylindrical coordinate system are developed and described. The electromagnetic fields and the plasma dynamics are solved in a self-consistent manner. A compact ECR (electron cyclotron resonance) plasma source used for the generation of ions for materials processing is simulated. This source has a plasma size of 3.6 cm in diameter and 3 cm in height. Simulation results of microwave power absorption, plasma potential, and microwave electric fields are presented. Distributed computing techniques are explored to handle the large computer memory requirements and the long computer simulation times associated with the three-dimensional particle-in-cell plasma model
Keywords :
discharges (electric); finite difference time-domain analysis; high-frequency discharges; plasma production; plasma simulation; simulation; 2.45 GHz; compact ECR plasma source; cylindrical coordinate system; distributed computing techniques; electromagnetic fields; electron dynamics; finite-difference time-domain technique; grid structure; ion dynamics; materials processing; microwave electric fields; microwave fields; microwave power absorption; numerical solutions; plasma excitation; plasma potential; self-consistent method; simulation; three-dimensional electromagnetic particle-in-cell model; Computational modeling; Distributed computing; Electromagnetic modeling; Electrons; Finite difference methods; Plasma materials processing; Plasma simulation; Plasma sources; Plasma stability; Time domain analysis;
Journal_Title :
Plasma Science, IEEE Transactions on