DocumentCode :
995689
Title :
Frequency effects in capacitively coupled radio-frequency glow discharges: a comparison between a 2-D fluid model and experiments
Author :
Goedheer, W.J. ; Meijer, P.M. ; Bezemer, J. ; van Sark, Wilfried G. J. H. M.
Author_Institution :
FOM Inst. for Plasma Phys., Nieuwegein
Volume :
23
Issue :
4
fYear :
1995
fDate :
8/1/1995 12:00:00 AM
Firstpage :
644
Lastpage :
649
Abstract :
The results of a 2-D fluid model for argon radiofrequency (RF) discharges in a closed cylindrical vacuum chamber are compared with experimental data from an amorphous silicon deposition reactor operated in argon. Good agreement is obtained for the relation between the DC autobias voltage and the dissipated power in the frequency range 40-100 MHz at pressures between 10 and 60 Pa. Scaling laws are presented for the dissipated power and for the ion fluxes toward the electrodes. These quantities are expressed in the DC bias voltage, the RF excitation frequency and the background pressure. Also the uniformity of the ion fluxes is studied. The model yields a linear relation between the applied RF voltage and the DC bias voltage. This relation depends only on the geometry of the discharge chamber and shows an offset
Keywords :
argon; glow discharges; high-frequency discharges; plasma; plasma transport processes; 10 to 60 Pa; 2D fluid model; 40 to 100 MHz; Ar; Ar discharge; DC autobias voltage; DC bias voltage; RF excitation frequency; amorphous Si deposition reactor; applied RF voltage; background pressure; capacitively coupled radio-frequency glow discharges; closed cylindrical vacuum chamber; discharge chamber; dissipated power; frequency effects; ion fluxes; linear relation; scaling laws; Argon; Electrodes; Geometry; Glow discharges; Inductors; Plasma applications; Radio frequency; Solid modeling; Surface discharges; Voltage;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.467986
Filename :
467986
Link To Document :
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