DocumentCode :
9959
Title :
Electron Barrier Engineering in a Thin-Film Intermediate-Band Solar Cell
Author :
Ahsan, Nazmul ; Miyashita, Naoya ; Kin Man Yu ; Walukiewicz, Wladek ; Okada, Yoshitaka
Author_Institution :
Res. Center for Adv. Sci. & Technol., Univ. of Tokyo, Tokyo, Japan
Volume :
5
Issue :
3
fYear :
2015
fDate :
May-15
Firstpage :
878
Lastpage :
884
Abstract :
Improved open-circuit voltages have been achieved in dilute nitride thin-film intermediate-band solar cells by optimizing intermediate-band barrier layers. The blocking properties of the AlGaAs electron barrier are found to critically depend on the barrier-doping level. Open-circuit voltages VOC improved when electron-doping levels in the AlGaAs barriers were reduced. This is ascribed to the increased association of VOC with the larger gap defined by the valence and conduction bands due to the improved electrical isolation of the intermediate band.
Keywords :
III-V semiconductors; aluminium compounds; conduction bands; gallium arsenide; semiconductor doping; semiconductor thin films; solar cells; thin film devices; valence bands; AlGaAs; AlGaAs electron barrier; barrier-doping level; conduction bands; dilute nitride thin-film intermediate-band solar cells; electrical isolation; electron barrier; electron-doping levels; intermediate band; intermediate-band barrier layers; open-circuit voltages; valence bands; Absorption; Doping; Electric potential; Gallium arsenide; Photonic band gap; Photovoltaic cells; Sun; Dilute nitride; intermediate-band (IB) solar cell; molecular beam epitaxy (MBE); thin-film solar cell;
fLanguage :
English
Journal_Title :
Photovoltaics, IEEE Journal of
Publisher :
ieee
ISSN :
2156-3381
Type :
jour
DOI :
10.1109/JPHOTOV.2015.2412451
Filename :
7076589
Link To Document :
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