DocumentCode
996854
Title
Evaluation of the Proton Induced Bulk Damage in SDRAM Utilizing 90 nm Process Technology
Author
Shindou, H. ; Kuboyama, S. ; Ikeda, N. ; Satoh, Y. ; Hirao, T. ; Tamura, T.
Author_Institution
Japan Aerosp. Exploration Agency, Tsukuba
Volume
54
Issue
6
fYear
2007
Firstpage
2233
Lastpage
2237
Abstract
We describe proton induced bulk damage observed in 90 nm process SDRAM. The degradation of the data retention ability was evaluated. The effect due to the difference of process technology and memory cell structure was discussed. The result indicates that the value of the capacitance of the storage capacitor and the volume of the depletion region are key parameters concerning the failures caused by bulk damage.
Keywords
DRAM chips; SRAM chips; proton effects; SDRAM; capacitance; data retention; memory cell structure; proton induced bulk damage; size 90 nm; storage capacitor; Capacitance; Capacitors; Degradation; Electric variables; Helium; Iron; Protons; SDRAM; Semiconductor devices; Single event upset; 90 nm; Bulk damage; SDRAM; protons; retention time;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2007.910876
Filename
4395080
Link To Document