• DocumentCode
    996854
  • Title

    Evaluation of the Proton Induced Bulk Damage in SDRAM Utilizing 90 nm Process Technology

  • Author

    Shindou, H. ; Kuboyama, S. ; Ikeda, N. ; Satoh, Y. ; Hirao, T. ; Tamura, T.

  • Author_Institution
    Japan Aerosp. Exploration Agency, Tsukuba
  • Volume
    54
  • Issue
    6
  • fYear
    2007
  • Firstpage
    2233
  • Lastpage
    2237
  • Abstract
    We describe proton induced bulk damage observed in 90 nm process SDRAM. The degradation of the data retention ability was evaluated. The effect due to the difference of process technology and memory cell structure was discussed. The result indicates that the value of the capacitance of the storage capacitor and the volume of the depletion region are key parameters concerning the failures caused by bulk damage.
  • Keywords
    DRAM chips; SRAM chips; proton effects; SDRAM; capacitance; data retention; memory cell structure; proton induced bulk damage; size 90 nm; storage capacitor; Capacitance; Capacitors; Degradation; Electric variables; Helium; Iron; Protons; SDRAM; Semiconductor devices; Single event upset; 90 nm; Bulk damage; SDRAM; protons; retention time;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2007.910876
  • Filename
    4395080