DocumentCode :
996992
Title :
Mechanisms of Enhanced Radiation-Induced Degradation Due to Excess Molecular Hydrogen in Bipolar Oxides
Author :
Chen, X.J. ; Barnaby, H.J. ; Vermeire, B. ; Holbert, K. ; Wright, D. ; Pease, R.L. ; Dunham, G. ; Platteter, D.G. ; Seiler, J. ; McClure, S. ; Adell, P.
Author_Institution :
Arizona State Univ., Tempe
Volume :
54
Issue :
6
fYear :
2007
Firstpage :
1913
Lastpage :
1919
Abstract :
Bipolar junction test structures packaged in hermetically sealed packages with excess molecular hydrogen (H2) showed enhanced degradation after radiation exposure. Using chemical kinetics, we propose a model that quantitatively establishes the relationship between excess H2 and radiation-induced interface trap formation. Using environments with different molecular hydrogen concentrations, radiation experiments were performed and the experimental data showed excellent agreement with the proposed model. The results, both experimentally and theoretically, showed increased radiation induced degradation with H2 concentration, and device degradation saturate at both high and low ends of H2 concentrations.
Keywords :
bipolar transistors; hydrogen neutral molecules; radiation effects; H2; bipolar junction test structures; bipolar oxides; chemical kinetics; excess molecular hydrogen; gated bipolar devices; hermetically sealed packages; radiation exposure; radiation-induced degradation; radiation-induced interface trap formation; Degradation; Electron traps; FETs; Hermetic seals; Hydrogen; Laboratories; MOSFETs; Packaging; Propulsion; Silicon devices; Bipolar oxide; gated bipolar devices; hydrogen; interface traps; radiation-induced;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2007.909708
Filename :
4395094
Link To Document :
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