DocumentCode :
997053
Title :
High-level injection in the epilayer of the I2L transistor
Author :
Yu, Kaiyuan
Author_Institution :
Bell-Northern Research, Ottawa, Canada
Volume :
13
Issue :
7
fYear :
1977
Firstpage :
202
Lastpage :
204
Abstract :
The simple classical treatment of high-level injection in the epi region of the I2L transistor predicts an increase dof intrinsic ß (ratio of electron to hole current) with increasing VBE. However, a careful consideration of the coupling between the hole and electron current predicts a decrease of ß, which was confirmed by experiment.
Keywords :
bipolar transistors; integrated logic circuits; semiconductor device models; I2L transistor; epilayer; high level injection;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19770148
Filename :
4249294
Link To Document :
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