DocumentCode :
997223
Title :
Silicon-based field-induced band-to-band tunnelling effect transistor
Author :
Kim, Kyung Rok ; Kim, Dae Hwan ; Song, Ki-Whan ; Baek, Gwanghyeon ; Kim, Hyun Ho ; Huh, Jung Im ; Lee, Jong Duk ; Park, Byung-Gook
Author_Institution :
Inter-Univ. Semicond. Res. Center, Seoul Nat. Univ., South Korea
Volume :
25
Issue :
6
fYear :
2004
fDate :
6/1/2004 12:00:00 AM
Firstpage :
439
Lastpage :
441
Abstract :
This letter reports a silicon-based field-induced band-to-band tunnelling effect transistor (FIBTET), which has a structure totally compatible with silicon-on-insulator (SOI) MOSFET. The field-induced band-to-band tunnelling effect between degenerate channel and source/drain is used as the key principle of the device operation. FIBTETs demonstrate the controllable negative differential transconductance characteristics at room temperature both for n-FIBTETs and p-FIBTETs. The size dependence of the device characteristics shows that the peak tunnelling current can be controlled by the layout design of channel length and width.
Keywords :
MOSFET; electric admittance; resonant tunnelling transistors; silicon-on-insulator; tunnelling; MOSFET; controllable negative differential transconductance; peak tunnelling current; silicon-based field-induced band-to-band tunnelling effect transistor; silicon-on-insulator; Doping; Logic circuits; Logic devices; MOSFET circuits; Resonant tunneling devices; Silicon on insulator technology; Size control; Temperature control; Transconductance; Voltage; Band-to-band tunneling; FIBTET; SOI MOSFET; degenerate; negative differential transconductance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2004.829668
Filename :
1302252
Link To Document :
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