Magnetic properties of Fe-Si thin films sputtered in mixed gas atmospheres

Author

Arai, K.I. ; Yamaguchi, M. ; Hayashi, Y. ; Murakami, K.

Author_Institution

Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan

Volume

25

Issue

5

fYear

1989

fDate

9/1/1989 12:00:00 AM

Firstpage

3976

Lastpage

3978

Abstract

An examination is reported of the magnetic properties and crystal structure of films prepared by sputtering with air or oxygen added to the Ar atmosphere. The coercive force of the film deposited in air plus Ar decreased to 1/5 of that of the film deposited in pure Ar, the crystal orientation changed, and the grain size became smaller. The coercive force of the films deposited in oxygen plus Ar decreased by a like amount. The initial permeability increased accordingly. It is suggested that these changes of the magnetic properties were caused by oxidation of Si in the films

Keywords

coercive force; ferromagnetic properties of substances; iron alloys; magnetic permeability; magnetic thin films; silicon alloys; sputtered coatings; Ar; Fe-Si thin films; O₂-Ar mixture; coercive force; crystal orientation; crystal structure; grain size; initial permeability; oxidation; sputtering; Argon; Atmosphere; Coercive force; Grain size; Magnetic films; Magnetic properties; Oxidation; Permeability; Semiconductor films; Sputtering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.42494

Filename

42494