Magnetic properties of Fe-Si thin films sputtered in mixed gas atmospheres

An examination is reported of the magnetic properties and crystal structure of films prepared by sputtering with air or oxygen added to the Ar atmosphere. The coercive force of the film deposited in air plus Ar decreased to 1/5 of that of the film deposited in pure Ar, the crystal orientation changed, and the grain size became smaller. The coercive force of the films deposited in oxygen plus Ar decreased by a like amount. The initial permeability increased accordingly. It is suggested that these changes of the magnetic properties were caused by oxidation of Si in the films