DocumentCode
998499
Title
Fabrication and accelerated hermeticity testing of an on-wafer package for RF MEMS
Author
Margomenos, Alexandros ; Katehi, Linda P B
Author_Institution
Radiat. Lab., Univ. of Michigan, Ann Arbor, MI, USA
Volume
52
Issue
6
fYear
2004
fDate
6/1/2004 12:00:00 AM
Firstpage
1626
Lastpage
1636
Abstract
A hermetic silicon micromachined on-wafer dc-to-40-GHz packaging scheme for RF microelectromechanical systems (MEMS) switches is presented. The designed on-wafer package has a deembedded insertion loss of 0.03 dB per transition up to 40 GHz (a total measured loss of 0.3 dB including a 2.7-mm-long through line) and a return loss below -18dB up to 40 GHz. The hermeticity of the packaged is tested using an autoclave chamber with accelerated conditions of 130°C, 2.7 atm of pressure, and 100% relative humidity. The fabrication process is designed so as to be completely compatible with the MEMS switch process, hence, allowing the parallel fabrication of all the components on a single wafer. The on-wafer proposed packaging approach requires no external wiring to achieve signal propagation and, thus, it has the potential for lower loss and better performance at higher frequencies.
Keywords
elemental semiconductors; micromachining; microswitches; semiconductor device packaging; silicon; 0.3 dB; 130 degC; RF MEMS switches; RF microelectromechanical systems switches; Si; accelerated hermeticity testing; deembedded insertion loss; hermetic silicon micromachined on-wafer packaging; relative humidity; signal propagation; Fabrication; Insertion loss; Life estimation; Loss measurement; Micromechanical devices; Packaging; Radiofrequency microelectromechanical systems; Silicon; Switches; Testing; Hermeticity testing; MEMS; RF microelectromechanical systems; on-wafer packaging; silicon micromachining;
fLanguage
English
Journal_Title
Microwave Theory and Techniques, IEEE Transactions on
Publisher
ieee
ISSN
0018-9480
Type
jour
DOI
10.1109/TMTT.2004.828467
Filename
1302367
Link To Document