Title :
Optical measurement of silicon membrane and beam thickness using a reflectance spectrometer
Author :
Bernstein, J. ; Denison, Mark ; Grieff, P.
Author_Institution :
Charles Stark Draper Lab., Cambridge, MA, USA
fDate :
6/1/1988 12:00:00 AM
Abstract :
An optical technique for measuring the thickness of silicon membranes and beams such as those used in micromechanical devices is presented. The measurement, based on reflectance spectrometry, is rapid and nondestructive. The reflectance-spectrometry technique can be used to measure silicon membrane thickness in the range from 0.1 to 5 μm
Keywords :
elemental semiconductors; membranes; reflectometry; semiconductor thin films; silicon; spectrometers; thickness measurement; 0.1 to 5 micron; 480 to 800 nm; Si; beam thickness measurement; membrane thickness measurement; micromechanical devices; optical technique; reflectance spectrometry; semiconductor; Annealing; Biomembranes; Capacitive sensors; Instruments; Optical films; Optical sensors; Reflectivity; Silicon; Spectroscopy; Thickness measurement;
Journal_Title :
Electron Devices, IEEE Transactions on
