• DocumentCode
    999068
  • Title

    New structure of enhancement-mode GaAs microwave m.o.s.f.e.t.

  • Author

    Mimura, Takashi ; Odani, Kyohei ; Yokoyama, Naoki ; Fukuta, Masahiro

  • Author_Institution
    Fujitsu Laboratories Ltd., Kawasaki, Japan
  • Volume
    14
  • Issue
    16
  • fYear
    1978
  • Firstpage
    500
  • Lastpage
    502
  • Abstract
    This letter proposes a new feasible device structure of an enhancement-mode GaAs deep-depletion m.o.s.f.e.t. as an attractive alternative to the junction-gate f.e.t.s and describes its microwave properties. The device has been fabricated on a high-resistance epitaxial n¿-layer by simple readily available technology without requiring the sophisticated control of the channel thickness needed for the conventional junction-gate f.e.t.s. The ´normally-off nature of the device can be explained on the basis of the substrate space-charge region extending over then¿-layer. The microwave performance of the device can be favourably compared with that of currently achievable junction-gate normally-off f.e.t.s. Unilateral gain drops to zero at a frequency slightly above 7 GHz.
  • Keywords
    III-V semiconductors; gallium arsenide; insulated gate field effect transistors; solid-state microwave devices; deep depletion MOSFET; enhancement mode GaAs microwave MOSFET; high resistivity epitaxial n- layer; microwave performance;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19780336
  • Filename
    4249497