DocumentCode
999068
Title
New structure of enhancement-mode GaAs microwave m.o.s.f.e.t.
Author
Mimura, Takashi ; Odani, Kyohei ; Yokoyama, Naoki ; Fukuta, Masahiro
Author_Institution
Fujitsu Laboratories Ltd., Kawasaki, Japan
Volume
14
Issue
16
fYear
1978
Firstpage
500
Lastpage
502
Abstract
This letter proposes a new feasible device structure of an enhancement-mode GaAs deep-depletion m.o.s.f.e.t. as an attractive alternative to the junction-gate f.e.t.s and describes its microwave properties. The device has been fabricated on a high-resistance epitaxial n¿-layer by simple readily available technology without requiring the sophisticated control of the channel thickness needed for the conventional junction-gate f.e.t.s. The ´normally-off nature of the device can be explained on the basis of the substrate space-charge region extending over then¿-layer. The microwave performance of the device can be favourably compared with that of currently achievable junction-gate normally-off f.e.t.s. Unilateral gain drops to zero at a frequency slightly above 7 GHz.
Keywords
III-V semiconductors; gallium arsenide; insulated gate field effect transistors; solid-state microwave devices; deep depletion MOSFET; enhancement mode GaAs microwave MOSFET; high resistivity epitaxial n- layer; microwave performance;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19780336
Filename
4249497
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