DocumentCode :
999650
Title :
Utilizing Diode Characteristics for GaN HEMT Channel Temperature Prediction
Author :
Darwish, Ali M. ; Bayba, Andrew J. ; Hung, H. Alfred
Author_Institution :
Army Res. Lab., Adelphi, MD
Volume :
56
Issue :
12
fYear :
2008
Firstpage :
3188
Lastpage :
3192
Abstract :
Measuring channel temperature in GaN high-electron mobility transistors (HEMTs) is challenging due to the submicrometer dimensions of the gate fingers. The HEMT characteristics are electrically and thermally dependent. The channel temperature is measured using the Schottky gate-diode forward characteristics and compared with results of simulation, theory, and experimental evidence. The pulsed gate-diode forward resistance and threshold voltage predict channel temperatures that agree well with other methods. The technique presented provides a fast, easily implementable methodology for estimating channel temperature.
Keywords :
III-V semiconductors; Schottky diodes; electrical resistivity; gallium compounds; high electron mobility transistors; wide band gap semiconductors; GaN; HEMT; Schottky gate-diode forward characteristics; channel temperature; high-electron mobility transistors; pulsed gate-diode forward resistance; threshold voltage; Channel temperature; GaN; field-effect transistor (FET); high-electron mobility transistor (HEMT); reliability; thermal resistance;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/TMTT.2008.2007364
Filename :
4682665
Link To Document :
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