DocumentCode
999748
Title
A new analytical model for the GaAs MESFET in the saturation region
Author
Pouvil, Pierre ; Gautier, Jean-Luc ; Pasquet, Daniel
Author_Institution
ENSEA, Cergy, France
Volume
35
Issue
8
fYear
1988
fDate
8/1/1988 12:00:00 AM
Firstpage
1215
Lastpage
1222
Abstract
A model that provides the static characteristics and the elements of the equivalent electrical scheme is presented. It is based on an approximate quadratic form for the depleted region under the gate when the electron velocity reaches the saturation velocity. The potential in the channel is calculated using Poisson´s equation and taking into account the variation of the electron density inside it. The main physical phenomena such as edge effects, overshoot velocity, and carrier injection in the buffer layer are also taken into account. Theoretical and experimental results for the I -V characteristics, transconductance, output conductance, gate-source capacitance, and gate-drain capacitance are presented for a submicrometer-gate MESFET. The results calculated using this model agree well with experimental data
Keywords
III-V semiconductors; Schottky gate field effect transistors; capacitance; gallium arsenide; semiconductor device models; GaAs; I-V characteristics; Poisson´s equation; analytical model; buffer layer; carrier injection; depleted region; edge effects; equivalent electrical scheme; experimental results; gate-drain capacitance; gate-source capacitance; models; output conductance; overshoot velocity; physical phenomena; saturation region; static characteristics; submicrometer-gate MESFET; submicron MESFETs semiconductors; transconductance; Analytical models; Buffer layers; Capacitance; Electron mobility; FETs; Gallium arsenide; MESFETs; Neodymium; Poisson equations; Transconductance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.2540
Filename
2540
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