Title of article :
Effects of hydrogen etching process on the structural and optical properties of nano-crystalline diamond films
Author/Authors :
LINJUN WANG، نويسنده , , Jian Huang، نويسنده , , Qingkai Zeng، نويسنده , , Ke Tang، نويسنده , , Run Xu، نويسنده , , Jijun Zhang، نويسنده , , YIBEN XIA، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
3
From page :
2174
To page :
2176
Abstract :
In this work, hydrogen etching method is applied to improve the quality of nano-crystalline diamond (NCD) films grown from hot-filament assisted chemical vapor deposition (HFCVD) system. From the characteristics of the structure and optical property, the grain size and surface roughness decrease while the optical transmission increase obviously under certain deposition parameters (gas pressure and substrate temperature) and longer etching time. Soft X-ray transmission measurements by synchrotron radiation are also carried out on the NCD films. The result shows that the X-ray transmission has an obvious improvement when the NCD film is fabricated from the hydrogen etching method. And the transmittance reaches 53.3% at X-ray photon energy of 258 eV, which has met the requirement for X-ray mask materials.
Keywords :
Plasma etching , Optical properties , Nano-crystalline diamond film
Journal title :
Applied Surface Science
Serial Year :
2012
Journal title :
Applied Surface Science
Record number :
1004426
Link To Document :
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