Title of article
Si nanocrystals in silicon nitride: An ellipsometric study using parametric semiconductor models
Author/Authors
P. Basa، نويسنده , , P. Petrik، نويسنده , , M. Fried، نويسنده , , L. Dobos، نويسنده , , B. Pecz ، نويسنده , , L. T?th، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2007
Pages
4
From page
76
To page
79
Abstract
Low-pressure chemical vapour deposited Si3N4/nc-Si/Si3N4 layers prepared on Si substrates were characterized by spectroscopic ellipsometry. Model Dielectric Function (MDF) was applied to obtain the thickness and the dielectric spectra of the middle nc-Si layer. Sensitive effect of the deposition time was obtained on the MDF parameters. A comparison is presented between the studied samples and reference materials.
Keywords
Si nanocrystals , Spectroscopic ellipsometry , Dielectric function
Journal title
Physica E Low-dimensional Systems and Nanostructures
Serial Year
2007
Journal title
Physica E Low-dimensional Systems and Nanostructures
Record number
1052182
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