Title of article :
Structural relaxation in sputter-deposited silica glass
Author/Authors :
Hirose، نويسنده , , Tomohiro and Saito، نويسنده , , Kazuya and Ikushima، نويسنده , , Akira J.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
6
From page :
2198
To page :
2203
Abstract :
We investigated structural relaxation below the glass transition temperature in sputter-deposited silica glass. Structural relaxation was obtained from annealing behavior of the IR reflection structural band position. Results were compared with that of bulk silica glass. Results showed the following. (1) The structural relaxation time is 106 times shorter than that of bulk silica glass. (2) The activation energy is close to that of bulk silica glass. (3) Once the structural relaxation reaches a steady state, the structure of silica glass film resembles that of bulk silica glass.
Keywords :
Films and coatings , sputtering , Optical properties , FTIR measurements , Oxide glasses , silica , stress relaxation , Viscosity and relaxation , structural relaxation , Viscoelasticity , VISCOSITY
Journal title :
Journal of Non-Crystalline Solids
Serial Year :
2006
Journal title :
Journal of Non-Crystalline Solids
Record number :
1372967
Link To Document :
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