Title of article :
Micrometer and nanometer-scale parallel patterning of ceramic and organic–inorganic hybrid materials
Author/Authors :
ten Elshof، نويسنده , , Johan E. and Khan، نويسنده , , Sajid U. and Gِbel، نويسنده , , Ole F.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Abstract :
This review gives an overview of the progress made in recent years in the development of low-cost parallel patterning techniques for ceramic materials, silica, and organic–inorganic silsesquioxane-based hybrids from wet-chemical solutions and suspensions on the micrometer and nanometer-scale. The emphasis of the discussion is placed on the application of soft-lithographic methods, but photolithography-aided patterning methods for oxide film growth are also discussed. In general, moulding-based patterning approaches and surface modification-based patterning approaches can be distinguished. Lateral resolutions well below 100 nm have been accomplished with some of these methods, but the fabrication of high-aspect ratio patterns remains a challenge.
Keywords :
patterning , Ceramic , Moulding , Soft lithography , Thin film
Journal title :
Journal of the European Ceramic Society
Journal title :
Journal of the European Ceramic Society