Author/Authors :
Xu، نويسنده , , F. and Minniti، نويسنده , , M. and Giallombardo، نويسنده , , C. and Cupolillo، نويسنده , , A. and Barone، نويسنده , , P. and Oliva، نويسنده , , A. and Papagno، نويسنده , , L.، نويسنده ,
Abstract :
We report an X-ray photoemission and electron energy loss study on 3 keV N 2 + ion implantation in single wall carbon nanotubes. Our results show that nitrogen atoms can bind to carbon in tetrahedral sp3, defects related pyridine-like, and triangular sp2 configurations and such bondings are stable for annealing up to 650 K. Heating at higher temperatures results in preferential substitutional nitrogen doping. This technique opens a new channel for controlled doping in carbon nanotubes for device applications.
Keywords :
Nitrogen molecule , Carbon nanotubes , Ion implantation , Ion bombardment , Photoelectron emission