Abstract :
A simple process for fabricating submicrometric magnetic arrays employing interference lithography, sputtering deposition and lift-off processes is proposed and demonstrated. The magnetic properties of cobalt (Co) arrays were measured and compared with those of a continuous Co magnetic film. The results show a dependence of the hysteresis curve on the orientation of the field as regards the array, which is correlated with the anisotropy of the structures and a dependence of the coercive field on the periodicity of the arrays. Moreover, an exchange bias effect was observed, which is ascribed to a ferromagnetic/antiferromagnetic (FM/AFM) coupling between Co and a thin surface cobalt oxide (CoO) layer.
