Angular distributions of N2 in the photodissociation of N2O adsorbed on a partially oxidized Si(100) surface at 95 K

The time-of-flight distributions of the N2 photofragment produced in the UV photodissociation of N2O adsorbed on a partially oxidized Si(100) surface at 95 K have been measured as a function of the desorption angle. Photoinduced electron transfer initiates the dissociation of N2O to produce an adsorbed oxygen atom and energetic N2 desorbing from the surface. Interestingly, the angular distribution of N2 originating from chemisorbed N2O molecules is peaked at ≈ 32° from the surface normal. The results are discussed on the basis of bonding geometry and photodissociation dynamics of N2O.