Title of article :
The effect of oxygen concentration on the low temperature deposition of TiO2 thin films
Author/Authors :
Toku، نويسنده , , H. and Pessoa، نويسنده , , R.S. and Maciel، نويسنده , , H.S. and Massi، نويسنده , , M. and Mengui، نويسنده , , U.A.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Abstract :
The aim of this study was to investigate the influence of oxygen concentration in Ar/O2 gas mixture on the crystalline properties of TiO2 thin films obtained at low temperature by reactive magnetron sputtering technique. Mass spectrometry of plasma medium provides, in conjunction with XRD and AFM measurements, a guide for attainment of good quality anatase TiO2 films.
Keywords :
morphology , Thin films , Titanium dioxide , sputtering , surface structure
Journal title :
Surface and Coatings Technology
Journal title :
Surface and Coatings Technology
