Author/Authors :
Barlak، نويسنده , , M. and Piekoszewski، نويسنده , , J. and Werner، نويسنده , , Z. and Sartowska، نويسنده , , B. and Pisarek، نويسنده , , M. and Walis، نويسنده , , L. and Starosta، نويسنده , , W. and Kolitsch، نويسنده , , A. and Grِetzchel، نويسنده , , R. and Bochenska، نويسنده , , K. and Pochrybniak، نويسنده , , C.، نويسنده ,
Abstract :
Wetting properties of ceramic materials may be enhanced by treating them with high-intensity plasma pulses carrying a substantial fraction of metallic ions. Rod Plasma Injectors (RPI), developed originally for fusion studies, may generate such plasma pulses containing the working gas used for discharge initiation and the metal ions eroded from the discharge electrodes. We examined the plasma pulse technology and concluded that it is possible to extend the range of system parameters appropriate for wetting enhancement. We also studied the physical properties of plasma treated carbon and silicon carbide samples in an attempt to disclose the origin of wettability differences between them. We finally conclude that these differences are due to the morphology of the treated surfaces.
